Welcome to our new site, if you can’t find what you’re looking for please get in touch via our contact us page.
Welcome to our new site, if you can’t find what you’re looking for please get in touch via our contact us page.
Edwards RV3 Two stage rotary vaccum pump 115/230V- 1-ph- 50/60Hz. Factory set to 230V for Europe• Speed (Pneurop 6602) 50 Hz: 3.3 m3h1 / 2 ft3min1 60Hz: 3.9 m3h1/ 2.3 ft3min1• Ultimate pressure 2.0 x 103mbar / 1.5 x 103 Torr• Inlet flange: NW25 / exhaust flange: NW25• Supplied with: 1 litre of Ultragrade 19 oil-inlet filter and O-ring• EMF10 (A46226000) exhaust oil mist filter recommended • Includes – A50505000UK/Ireland 2m mains lead
Edwards RV3 Two stage rotary vaccum pump 115/230V- 1-ph- 50/60Hz. Factory set to 230V for Europe• Speed (Pneurop 6602) 50 Hz: 3.3 m3h1 / 2 ft3min1 60Hz: 3.9 m3h1/ 2.3 ft3min1• Ultimate pressure 2.0 x 103mbar / 1.5 x 103 Torr• Inlet flange: NW25 / exhaust flange: NW25• Supplied with: 1 litre of Ultragrade 19 oil-inlet filter and O-ring• EMF10 (A46226000) exhaust oil mist filter recommended • Includes – A50505000UK/Ireland 2m mains lead
High purity carbon fibre thread on coil, 2 metre.
SEMI-KLEEN plasma cleaner- standard configuration including tabletop controller with embedded microcomputer and LCD touchscreen user interface; Remote plasma source (high quality quartz tube) with KF/NW40 vacuum interface.Low particle source design- qualified for semiconductor application where PWP is a concern. PC remote control software with intuitive user interface.60-recipe support in microcontroller. 75 Watt RF power supply- no need to adjust impedance matching.Plasma sensor for plasma strength monitor;Electronic gas flow control with pressure sensor feedback control. Smart-Schedule feature for automatic cleaning. Intelligent safe and expert operation mode. 15 feet high quality high power RF cable; D-Sub 9 PC control cable; D-Sub 15 source control cable.
SEMI-KLEEN plasma cleaner- standard configuration including tabletop controller with embedded microcomputer and LCD touchscreen user interface; Remote plasma source (high quality quartz tube) with KF/NW40 vacuum interface.Low particle source design- qualified for semiconductor application where PWP is a concern. PC remote control software with intuitive user interface.60-recipe support in microcontroller. 75 Watt RF power supply- no need to adjust impedance matching.Plasma sensor for plasma strength monitor;Electronic gas flow control with pressure sensor feedback control. Smart-Schedule feature for automatic cleaning. Intelligent safe and expert operation mode. 15 feet high quality high power RF cable; D-Sub 9 PC control cable; D-Sub 15 source control cable.
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.