Benchtop & chamber-mounted plasma systems
At the heart of the PIE Scientific range are innovative, technology-leading plasma cleaning systems. There are two product groups. The “KLEEN” range are compact, column-mounted RF plasma cleaners designed for use with SEM, FIB/SEM, FIB, XPS,SIMS, AES. Tergeo are class-leading, bench top RF plasma cleaners designed for a wide range of plasma etching, ashing and cleaning applications.
KLEEN series: compact, chamber-mounted RF plasma cleaners
- EM-KLEEN. A column-mounted downstream plasma cleaner for SEM, FIB/SEM, FIB, XPS, SIMS, AES etc
- SEMI-KLEEN Quartz. A column-mounted downstream plasma cleaner for contamination removal in semiconductor instrumentation
- SEMI-KLEEN sapphire. A column-mounted downstream plasma cleaner optimised for aggressive and corrosive gases
- Â TEM-Cube multi-purpose chamber. High vacuum TEM specimen holder storage, leak checker and plasma cleaning chamber
Tergeo series: benchtop RF plasma systems
- Tergeo-EM. A bench top RF plasma cleaner for SEM and TEM specimen/holder cleaning and for the highly controlled hydrophobic/hydrophilic treatment of TEM specimen grids. Includes direct (immersion) and downstream cleaning mode
- Tergeo. A bench top RF plasma etcher/asher/cleaner for research and low volume production (110mm Ø chamber)
- Tergeo-Plus. With larger 160mm Ø chamber
- Tergeo-Pro. With extra large 230mm Ø chamber
