SEMI-KLEEN plasma cleaner- standard configuration including tabletop controller with embedded microcomputer and LCD touchscreen user interface; Remote plasma source (high quality quartz tube) with KF/NW40 vacuum interface.Low particle source design- qualified for semiconductor application where PWP is a concern. PC remote control software with intuitive user interface.60-recipe support in microcontroller. 75 Watt RF power supply- no need to adjust impedance matching.Plasma sensor for plasma strength monitor;Electronic gas flow control with pressure sensor feedback control. Smart-Schedule feature for automatic cleaning. Intelligent safe and expert operation mode. 15 feet high quality high power RF cable; D-Sub 9 PC control cable; D-Sub 15 source control cable.
Upgrade kit for converting CCU-010 LV to high vacuum CCU-010 HV specification. Includes turbomolecular pump (Pfeiffer Hi Pace 80), conversion kit, cable and other small components. Note: the rotary vacuum pump used with the LV version will be required to “back” the internally mounted turbomolecular pump.
Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating