Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
Upgrade kit for converting CCU-010 LV to high vacuum CCU-010 HV specification. Includes turbomolecular pump (Pfeiffer Hi Pace 80), conversion kit, cable and other small components. Note: the rotary vacuum pump used with the LV version will be required to “back” the internally mounted turbomolecular pump.