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Third MFC regulated gas input
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Water vapour delivery kit for generating water vapour plasma, creating super hydrophilic surface with high density OH* functional groups on surface.
Integrated remote plasma source for downstream cleaning mode for 2D materials. For fragile, delicate samples
HS-010 head storage box for maintaining sputtering or carbon modules under vacuum when not in use.
Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating