Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
Consisting of base plate for connection to the tilt and height adjustable specimen table of the CCU-010 base unit. Specimen holders for six large (Ø 25.4mm) or six small (Ø12.7mm) SEM pin stubs. DC micro-motor for rotation and planetary movement, quartz sensor (centre), speed control: 0-100%, rotation: 0-20rpm approximately, planets: 0-65rpm approximately