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Current imaging module
Current imaging module. A system for measuring and mapping current flow to a biased tip that is scanned over the specimen surface.
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SP-010 sputtering module
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
SKU: 100002Price On Request £0.00 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteSP-010 sputtering module
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
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APT package EBIC/EBAC with remote control
APT package EBIC/EBAC with remote control. An amplifier system for electron beam induced current (EBIC), electron beam absorbed current (EBAC) and a range of other analysis techniques. It connects the signal from an LCMK-EM to the video-input of the electron microscope. The amplifier is controlled via the APT GUI.
SKU: AD-APT-DIG-EBC-003Price On Request £0.00 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteAPT package EBIC/EBAC with remote control
APT package EBIC/EBAC with remote control. An amplifier system for electron beam induced current (EBIC), electron beam absorbed current (EBAC) and a range of other analysis techniques. It connects the signal from an LCMK-EM to the video-input of the electron microscope. The amplifier is controlled via the APT GUI.
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ET-010 integrated plasma stage
Plasma cleaning accessory for the pre-treatment (cleaning) or after-treatment (glow discharge effect) of specimens in combination with a coating process.
SKU: 1000010Price On Request £0.00 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteET-010 integrated plasma stage
Plasma cleaning accessory for the pre-treatment (cleaning) or after-treatment (glow discharge effect) of specimens in combination with a coating process.
£0.00Price On Request -
CCU-010 LV (standard vacuum)
Safematic CCU-010 LV compact, fully automatic standard vacuum coating system. Including dual-position terminating film thickness monitoring system. Please note that for a complete working system the CCU-010LV requires the following: backing rotary vacuum pump (A65201903), oil mist filter (A46226000) and pumping hose (C10514297). Select coating head option SP-010 (sputteringing), CT-010 (carbon evaporation) or both. Select required sputtering target(s). Detailed description: • glass work chamber- 104 mm Ø x 106 mm (DN 100 ISO-KF compatible)• implosion guard and safety monitoring• table (Ø 80 mm) – tilt and height adjustable • multi-sample holder for 20 standard (13 mm) pin stubs to meet most requirements• film thickness monitor (FTM) based on a quartz crystal oscillator- usable in two positions (centre/edge)• full range power supply (90-260VAC- 50/60Hz)• coating process head interface (gas and electric) including automatic detection• 5.7“ TFT touch display• recipe-driven user interface for guaranteed reproducible results• storage / view of the last ten coating processes• automatic vent of the system when power failures – prevents backstreaming of oil from the rotary pump• intuitive operator’s software• graphic display of process data with Windows-based software Coating LAB (option)• flange connection (KF25) for connection of an external roughing pump• external alarm connector• USB service interface for easy analysis and software upgrades• automatic valve control for two process gases and venting• operating manual
SKU: 100000Price On Request £0.00 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteCCU-010 LV (standard vacuum)
Safematic CCU-010 LV compact, fully automatic standard vacuum coating system. Including dual-position terminating film thickness monitoring system. Please note that for a complete working system the CCU-010LV requires the following: backing rotary vacuum pump (A65201903), oil mist filter (A46226000) and pumping hose (C10514297). Select coating head option SP-010 (sputteringing), CT-010 (carbon evaporation) or both. Select required sputtering target(s). Detailed description: • glass work chamber- 104 mm Ø x 106 mm (DN 100 ISO-KF compatible)• implosion guard and safety monitoring• table (Ø 80 mm) – tilt and height adjustable • multi-sample holder for 20 standard (13 mm) pin stubs to meet most requirements• film thickness monitor (FTM) based on a quartz crystal oscillator- usable in two positions (centre/edge)• full range power supply (90-260VAC- 50/60Hz)• coating process head interface (gas and electric) including automatic detection• 5.7“ TFT touch display• recipe-driven user interface for guaranteed reproducible results• storage / view of the last ten coating processes• automatic vent of the system when power failures – prevents backstreaming of oil from the rotary pump• intuitive operator’s software• graphic display of process data with Windows-based software Coating LAB (option)• flange connection (KF25) for connection of an external roughing pump• external alarm connector• USB service interface for easy analysis and software upgrades• automatic valve control for two process gases and venting• operating manual
£0.00Price On Request