Welcome to our new site, if you can’t find what you’re looking for please get in touch via our contact us page.
Ultra-flat P{100} silicon wafer- Ø6inch/150mm – 675µm thickness”
Nano-Tec ultra-flat P{100} silicon wafer, Ø6inch/150mm – 675µm thickness (each)
£110.92
Related products
-
ET-010 integrated plasma stage
Plasma cleaning accessory for the pre-treatment (cleaning) or after-treatment (glow discharge effect) of specimens in combination with a coating process.
Price On Request £0.00 Add to basket
ET-010 integrated plasma stage
Plasma cleaning accessory for the pre-treatment (cleaning) or after-treatment (glow discharge effect) of specimens in combination with a coating process.
£0.00Price On Request -
Micro-Tec diced P{100} diameter: 4inch/100mm silicon wafer
Micro-Tec diced P{100} diameter 4inch/100mm silicon wafer, diced in 7.5 x 7.5mm chips – 525um thickness ~112 Chips (each)
£79.28 Add to basket
Micro-Tec diced P{100} diameter: 4inch/100mm silicon wafer
Micro-Tec diced P{100} diameter 4inch/100mm silicon wafer, diced in 7.5 x 7.5mm chips – 525um thickness ~112 Chips (each)
£79.28 -
HS-010 head module storage box
HS-010 head storage box for maintaining sputtering or carbon modules under vacuum when not in use.
Price On Request £0.00 Add to basket
HS-010 head module storage box
HS-010 head storage box for maintaining sputtering or carbon modules under vacuum when not in use.
£0.00Price On Request -
SP-010 sputtering module
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
Price On Request £0.00 Add to basket
SP-010 sputtering module
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
£0.00Price On Request