Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
Edwards nXDS10i dry scroll pump.Peak pumping speed 11.4 m3/hr (6.7 cfm). Ultimate pressure 0.007 mbar (0.005 torr).Pump controller with push button control- remote serial and parallel control plus USB service interface.Supply 100-127/200-240V (+/- 10%) 1ph 50/60Hz without user intervention.Inlet port : NW25- exhaust port : NW25
Plasma cleaning accessory for the pre-treatment (cleaning) or after-treatment (glow discharge effect) of specimens in combination with a coating process.
Coating LAB Windows-based software can be installed on a laptop for monitoring and documenting coating processes. Fully automatic logs and charts containing all process-related data can be exported as screenshots or CSV files for Office applications. Available information includes process vacuum, current and voltage along with film thickness and coating rates (Internet connection required). Coating-LAB will allow remote service access for error diagnosis and process optimisation.