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EM-Tec W8 wafer holder for Ø200mm / 8inch wafers- M4
EM-Tec W8 wafer holder for Ø200mm / 8inch wafers- M4 (each)
£310.57
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ET-010 integrated plasma stage
Plasma cleaning accessory for the pre-treatment (cleaning) or after-treatment (glow discharge effect) of specimens in combination with a coating process.
SKU: 1000010Price On Request £0.00 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteET-010 integrated plasma stage
Plasma cleaning accessory for the pre-treatment (cleaning) or after-treatment (glow discharge effect) of specimens in combination with a coating process.
£0.00Price On Request -
EM-Tec W4 wafer holder for Ø100mm / 4inch wafers – M4
EM-Tec W4 wafer holder for Ø100mm / 4inch wafers – M4 (each)
SKU: 12-000384£265.56 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteEM-Tec W4 wafer holder for Ø100mm / 4inch wafers – M4
EM-Tec W4 wafer holder for Ø100mm / 4inch wafers – M4 (each)
£265.56 -
Edwards RV3 rotary vacuum pump (including Ultragrade oil) with 2m UK mains lead
Edwards RV3 Two stage rotary vaccum pump 115/230V- 1-ph- 50/60Hz. Factory set to 230V for Europe• Speed (Pneurop 6602) 50 Hz: 3.3 m3h1 / 2 ft3min1 60Hz: 3.9 m3h1/ 2.3 ft3min1• Ultimate pressure 2.0 x 103mbar / 1.5 x 103 Torr• Inlet flange: NW25 / exhaust flange: NW25• Supplied with: 1 litre of Ultragrade 19 oil-inlet filter and O-ring• EMF10 (A46226000) exhaust oil mist filter recommended • Includes – A50505000UK/Ireland 2m mains lead
SKU: A65201903Price On Request £0.00 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteEdwards RV3 rotary vacuum pump (including Ultragrade oil) with 2m UK mains lead
Edwards RV3 Two stage rotary vaccum pump 115/230V- 1-ph- 50/60Hz. Factory set to 230V for Europe• Speed (Pneurop 6602) 50 Hz: 3.3 m3h1 / 2 ft3min1 60Hz: 3.9 m3h1/ 2.3 ft3min1• Ultimate pressure 2.0 x 103mbar / 1.5 x 103 Torr• Inlet flange: NW25 / exhaust flange: NW25• Supplied with: 1 litre of Ultragrade 19 oil-inlet filter and O-ring• EMF10 (A46226000) exhaust oil mist filter recommended • Includes – A50505000UK/Ireland 2m mains lead
£0.00Price On Request -
GD-010 glow discharge
Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating
SKU: 100004Price On Request £0.00 Add to basketAdd to QuoteWithin your QuoteAdd to QuoteGD-010 glow discharge
Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating
£0.00Price On Request