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Gold coated silicon wafer, diameter 51mm 275µm – 50nm thick, Au
Nano-Tec gold coated silicon wafer, diameter 2”/51mm 275µm thickness – 50nm, Au (each)
£103.42
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Gold coated Si wafer- diameter 100mm- 525 and 956mm- 50nm thick- Au
Nano-Tec gold coated silicon wafer- Ø4″”/100mm- 525and#956;m thickness- 50nm Au (each)
£200.62 Add to basket
Gold coated Si wafer- diameter 100mm- 525 and 956mm- 50nm thick- Au
Nano-Tec gold coated silicon wafer- Ø4″”/100mm- 525and#956;m thickness- 50nm Au (each)
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GD-010 glow discharge
Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating
Price On Request £0.00 Add to basket
GD-010 glow discharge
Glow discharge attachment for hydrophilic/hydrophobic treatment (rendering) of substrates (e.g. TEM carbon support films). Fully integrated to allow post-treatment of carbon films without the need to break vacuum after carbon coating
£0.00Price On Request -
EMF10 mist filter
Edwards EMF10 oil mist filter suitable for use with an RV3 pump. Supplied with NW25 clamp, centering ring and O- ring- NW25 to 3/4 inch BSP adaptor.
£271.60 Add to basket
EMF10 mist filter
Edwards EMF10 oil mist filter suitable for use with an RV3 pump. Supplied with NW25 clamp, centering ring and O- ring- NW25 to 3/4 inch BSP adaptor.
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SP-010 sputtering module
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
Price On Request £0.00 Add to basket
SP-010 sputtering module
Fully integrated magnetron (type A) sputtering module for standard sputtering rates. Including high resolution sputtering assembly. Fitted with target cooling and monitoring – automatic source shutter and electronically controlled process vacuum control. Note: sputtering target not included – please select required metat target(s) from the options list.
£0.00Price On Request